Fabrication of complex shape 3D photonic nanostructures by FIB lithography

被引：0
|
作者：
Rogov, Oleg Y. [1 ]
Artemov, Vladimir V. [1 ]
Gorkunov, Maxim V. [1 ]
Ezhov, Alexander A. [1 ,2 ]
Palto, Serguei P. [1 ]
机构：
[1] Russian Acad Sci, Shubnikov Inst Crystallog, Moscow 119333, Russia
[2] Moscow MV Lomonosov State Univ, Moscow 119991, Russia
来源：
2015 IEEE 15TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO) | 2015年
基金：
俄罗斯科学基金会;
关键词：
chirality; nanostructures; polarization rotation; EXTRAORDINARY OPTICAL-TRANSMISSION; PLASMONICS;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We report fabrication of complex 3D shape nanostructures by single-pass focused ion beam milling of freely suspended metal foils and films on dielectric substrates. The approach benefits from the accuracy in nano fabrication and decreased overdeposition. The fabricated nanostructured thin films posses optical properties valuable for photonic applications: extraordinary transmission and extreme chirality.
引用
收藏
页码：136 / 139
页数：4
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