Effect of ultraprecision grinding on the microstructural change in silicon monocrystals

被引:80
|
作者
Zarudi, I [1 ]
Zhang, LC [1 ]
机构
[1] Univ Sydney, Dept Mech & Mechatron Engn, Ctr Adv Mat Technol, Sydney, NSW 2006, Australia
基金
澳大利亚研究理事会;
关键词
ultraprecision grinding; subsurface structure; amorphous; silicon;
D O I
10.1016/S0924-0136(98)00090-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of ultraprecision grinding on microstructural change in silicon monocrystals, such as surface roughness and dislocation structure, was investigated both experimentally and theoretically. The study found that there exists an additional concentration of oxygen and carbon in an amorphous layer for all investigated grinding regimes with their distributions dependent on the grinding variables. It showed that two atomic bonding configurations exist in the amorphous layer, i.e. silicon oxide in the surface region followed by amorphous silicon. The research established that the grinding table speed affects the thickness of the dislocation layer in the subsurface. Increase of the table speed leads to a thicker dislocation zone and created microcracks. The paper concludes that the ductile mode of material removal in the grinding of silicon monocrystals is due to the formation of the amorphous phase. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:149 / 158
页数:10
相关论文
共 50 条
  • [1] Effect of ultraprecision grinding on the microstructural change in silicon monocrystals
    Univ of Sydney, Sydney
    J Mater Process Technol, 1-3 (149-158):
  • [2] Ultraprecision grinding technologies in silicon semiconductor processing
    Ahearne, E
    Byrne, G
    PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART B-JOURNAL OF ENGINEERING MANUFACTURE, 2004, 218 (03) : 253 - 267
  • [3] Effect of hydrodynamic pressure on ultraprecision grinding
    Hwang, Yeon
    Kim, Hye-Jeong
    Kim, Jeong-Ho
    6TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES, 2012, 8416
  • [4] Microstructural and reliability in grinding of silicon nitride
    Liu, CC
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2004, 379 (1-2): : 437 - 442
  • [5] Ultraprecision grinding of silicon wafers using a newly developed diamond wheel
    Zhou, Hongxiu
    Guo, Miao
    Wang, Xinze
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2017, 68 : 238 - 244
  • [6] NEUTRON EFFECT ON SILICON MONOCRYSTALS
    FANICA, M
    GHITA, I
    MESTER, A
    STUDII SI CERCETARI DE FIZICA, 1975, 27 (10): : 985 - 990
  • [7] Ultraprecision grinding and single point diamond turning of silicon wafers and their characterization
    Kerstan, M
    Ehlert, A
    Huber, A
    Helmreich, D
    Beinert, J
    Döll, W
    Schinker, M
    PROCEEDINGS OF: SILICON MACHINING: 1998 SPRING TOPICAL MEETING, 1998, : 32 - 35
  • [8] Study on Material Removal Mechanism of Silicon Nitride during ELID Ultraprecision Grinding
    Jin, Weidong
    ADVANCED MANUFACTURING TECHNOLOGY, PTS 1-3, 2011, 314-316 : 1740 - 1745
  • [9] Residual stress analysis on silicon wafer surface layers induced by ultraprecision grinding
    ZHANG Yinxiaa
    RareMetals, 2011, 30 (03) : 278 - 281
  • [10] An advanced ultraprecision face grinding machine
    Corbett, J. (j.corbett@cranfield.ac.uk), 1600, Springer-Verlag London Ltd (20):