Analysis of Ni/MgO(001) interface growth by low-incident-angle X-ray diffraction

被引：0
|
作者：
Barbier, A [1 ]
Renaud, G [1 ]
Robach, O [1 ]
机构：
[1] CEA Grenoble, SP2M, IRS, Dept Rech Fondamentale Mat Condensee, F-38054 Grenoble, France
来源：
JOURNAL DE PHYSIQUE IV | 1998年 / 8卷 / P4期
关键词：
D O I：
10.1051/jp4:1998427
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：221 / 226
页数：6
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