Thermodynamic analysis for crystal growth of the III-V compound

被引:0
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作者
Yamaguchi, K [1 ]
Takeda, Y [1 ]
机构
[1] Iwate Univ, Fac Engn, Dept Mat Sci & Technol, Morioka, Iwate 020, Japan
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T [工业技术];
学科分类号
08 ;
摘要
Partial pressure - temperature - composition correlation diagrams of the Ga-As, In-As, Ga-P and In-P systems were contracted based on the obtained experimental data of the phase diagram and thermodynamic properties for the III-V systems. The total vapor pressures of arsenic or phosphorus at melting point of GaAs, InAs, GaP and InP were determined as 101, 10.1, 1510 and 253 kPa, respectively, at the corresponding melting points of 1509, 1211, 1739 and 1336K These diagrams are applied to the analysis of the horizontal Bridgman method and the liquid phase epitaxial growth technique. On the other hand, the analysis of the equilibrium state of the chloride-CVD process was carried out using the data of the Gibbs energy of the compounds obtained by authors.
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页码:209 / 212
页数:4
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