InP-based deep-ridge NPN transistor laser

被引:8
|
作者
Liang, S. [1 ]
Kong, D. H. [1 ]
Zhu, H. L. [1 ]
Zhao, L. J. [1 ]
Pan, J. Q. [1 ]
Wang, W. [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
OPERATION; EPITAXY;
D O I
10.1364/OL.36.003206
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report an InP-based deep-ridge NPN transistor laser (TL, lambda similar to 1.5 mu m). By placing the quantum well (QW) active material above the heavily Zn-doped base layer, both the optical absorption of the heavily p-doped base material and the damage of the quality of the QWs resulted from the Zn diffusion into the QWs are decreased greatly. CW operation of the TL is achieved at -40 degrees C, which is much better than the shallow-ridge InP-based NPN TL. With future optimization of the growth procedure, significant improvement of the performance of the deep-ridge InP-based NPN TLs is expected. (C) 2011 Optical Society of America
引用
收藏
页码:3206 / 3208
页数:3
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