Characterization of multi-domain bumps of organic resists in color filters for wide-viewing-angle liquid crystal displays

被引:0
|
作者
Koo, Horng-Show [1 ,3 ]
Chen, Mi [2 ]
Yang, Sheng-Hung [1 ]
Kawai, Tomoji [3 ]
机构
[1] Minghsin Univ Sci & Technol, Dept Optoelect Syst Engn, Hsinchu 304, Taiwan
[2] Minghsin Univ Sci & Technol, Dept Mat Sci & Engn, Hsinchu 304, Taiwan
[3] Osaka Univ, Inst Sci Ind Res, Nanosci & Nanotechnol Ctr, Osaka 5670047, Japan
关键词
photoresit; multi-domain vertical alignment; color filter; wide view angle; protrudent bump; transmittance;
D O I
10.1143/JJAP.47.4950
中图分类号
O59 [应用物理学];
学科分类号
摘要
Negative-type multi-domain vertical alignment (MVA) photoresists have technically been fabricated and integrated in color filter processing for the application of wide-viewing-angle liquid crystal displays. The expectable results including excellent light transmittance, stability and uniformity of protrudent bumps in shape, superior reliability in material characteristics and wider gamut have extensively been achieved. The superior brightness (GY) of negative-type photo resists used in color filters to positive-type photoresists is attended with the result of excellent transmittances. The transmittances of positive-type and negative-type protrudent bumps photoresists in color filters are 70 and 100%, respectively. NTSC ratio of the color-filter sample with negative-type photoresist in MVA protrudent bumps is improved from 61.9 to 62.8% and higher. Comparisons in characteristics between negative-type (NPR) photoresist and positive-type (PPR) photoresist materials have eventually been analyzed and demonstrated as well.
引用
收藏
页码:4950 / 4953
页数:4
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