A model describing the energy distribution of ions bombarding electrodes in an RF-plasma reactor

被引：1
|
作者：
Altanzog, P
Albert, M
Schade, K
机构：
[1] TECH UNIV DRESDEN, INST HALBLEITER & MIKROSYST TECH, D-01062 DRESDEN, GERMANY
[2] MONGOLIAN ACAD SCI, INST PHYS & TECHNOL, ULAANBAATAR 210651, MONGOLIA
[3] FORSCH APPLIKAT LAB PLASMATECH GMBH, D-01217 DRESDEN, GERMANY
来源：
THIN SOLID FILMS | 1996年 / 286卷 / 1-2期
关键词：
chemical vapour; computer simulation; deposition process; ion bombardment;
D O I：
10.1016/S0040-6090(96)08537-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A model has been presented for the ion bombardment energy distribution at both electrodes of a planar RF plasma reactor. Charge-exchange collision in the sheath is assumed to be the mechanism which limits the fast ions and generates the energetic neutrals. Using the electrical and geometric parameters of the reactor, the model predicts the relative ion and fast neutral bombardment energy distributions. The results were compared with experimental values.
引用
收藏
页码：159 / 163
页数：5
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