Effects of annealing temperature on morphology and thickness of samarium electrodeposited thin films

被引:11
|
作者
Burns, Jonathan D. [1 ,2 ]
Myhre, Kristian G. [1 ,3 ]
Sims, Nathan J. [1 ]
Stracener, Daniel W. [4 ]
Boll, Rose A. [1 ]
机构
[1] Oak Ridge Natl Lab, Nucl Secur & Isotope Technol Div, POB 2008, Oak Ridge, TN 37831 USA
[2] Texas A&M Univ, Nucl Sci Secur & Policy Inst, College Stn, TX 77845 USA
[3] Univ Tennessee, Bredesen Ctr Interdisciplinary Res & Grad Educ, Knoxville, TN 37996 USA
[4] Oak Ridge Natl Lab, Div Phys, POB 2008, Oak Ridge, TN 37831 USA
关键词
Electrodeposition; Samarium; Electroplated deposition; Thin film; ALPHA-SPECTROMETRY; ACTINIDE TARGETS; ELEMENTS;
D O I
10.1016/j.nima.2016.05.062
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Electroplated depositions of Sm were prepared using a vertical well-type electrodeposition unit with an aqueous ammonium acetate electrolyte system, with an average deposition yield just over 87%. The depositions were analyzed for morphology and thickness by scanning electron microscopy (SEM) and chemical composition by energy dispersion X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) before and after firing. The depositions were fired at 125-700 degrees C, while varying the heating rate from 0.5 to 10 degrees C/min in either an oxidizing or reducing atmosphere. A heating rate of 10 degrees C/min was slow enough to prevent disruption of the deposition morphology during firing. A gas sweep enhanced the removal of any organic substituents, with an oxidizing environment being more advantageous than a reducing environment. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:95 / 101
页数:7
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