UV-Assisted Annealing Effect on the Performance of an Electrolyte-Gated Transistor Based on Inkjet Printed ZnO Nanoparticles Blended With Zinc Nitrate

被引:8
|
作者
Morais, Rogerio Miranda [1 ]
Vieira, Douglas Henrique [1 ]
Ozorio, Maiza da Silva [1 ]
Pereira, Luis [2 ]
Martins, Rodrigo [2 ]
Alves, Neri [1 ]
机构
[1] Sao Paulo State Univ UNESP, Fac Sci & Technol FCT, Dept Phys, BR-19060560 Presidente Prudente, SP, Brazil
[2] Univ NOVA Lisboa, CEMOP UNINOVA, Dept Mat Sci, Fac Sci & Technol FCT,CENIMAT I3N, P-2829516 Caparica, Portugal
基金
巴西圣保罗研究基金会;
关键词
Zinc oxide; Annealing; II-VI semiconductor materials; Transistors; Zinc; Printing; Substrates; Electrolyte-gated transistor (EGT); inkjet printing; ultraviolet (UV)-assisted annealing; zinc oxide (ZnO); THIN-FILM TRANSISTORS; LOW-TEMPERATURE; DEPOSITION; RAMAN;
D O I
10.1109/TED.2021.3139852
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Solution-processed devices are in general compatible with flexible and conformable electronics. However, some promising materials needs to be processed at high temperatures, which limits the applications and the use of different substrates. Among these materials we can highlight zinc oxide (ZnO), a semiconductor that stands out for transistors applications and is, in general, obtained at temperatures around 300 degrees C-400 degrees C. Here, we reported the combination of annealing at 150 degrees C, ultraviolet (UV) treatment and blending of ZnO nanoparticles (ZnO-NPs) with zinc nitrate and urea as a strategy to fabricate an inkjet printed electrolyte-gated transistor (EGT) with reduced temperature and improved performance, including a significant mobility improvement to 0.21 cm(2)/V center dot s, operating below 2 V bias, which is around 460% higher than the mobility of the EGT fabricated purely with ZnO-NPs.
引用
收藏
页码:1538 / 1544
页数:7
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