Thin film;
Ferromagnetism;
Dilute magnetic semiconductors;
Defects;
D O I:
暂无
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Pure and Indium (In) doped SnO2 nanocrystalline thin films have been fabricated using sol-gel technique. The effect of In-doping on structural, optical and magnetic properties has been studied. Scanning electron microscopy (SEM) study reveals that the grains of pure and doped SnO2 possesses spherical symmetry. X-ray diffraction (XRD) study reveals that pure and In-doped SnO2 thin films possess rutile structure having tetragonal phase. UV-visible study suggests that with In-doping in SnO2, the value of the band gap first increases (upto 5% In-concentration) but further increase in concentration of In to 25% leads to decrease in band gap. It has been found from the room temperature magnetic study that pure and In-doped SnO2 thin films show ferromagnetic behaviour, however with 5% In-doping saturation magnetization value increased. The observed ferromagnetic behaviour may be due to the defects and oxygen vacancies.
机构:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, IndiaThin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, India
Gopinadhan, K.
Kashyap, Subhash C.
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机构:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, IndiaThin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, India
Kashyap, Subhash C.
Pandya, Dinesh K.
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机构:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, IndiaThin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, India
Pandya, Dinesh K.
Chaudhary, Sujeet
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机构:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, IndiaThin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, India
机构:
Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
Ji, Z
Zhao, L
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机构:
Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
Zhao, L
He, ZP
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Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
He, ZP
Zhou, Q
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机构:
Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
Zhou, Q
Chen, C
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机构:
Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R ChinaZhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China