Low-temperature dissociative adsorption of H on W, Mo, and Ta surfaces studied with mechanically controllable break-junctions

被引：9

作者：

den Boer, D. ^{[1
]}

Shklyarevskii, O. I. ^{[1
,2
]}

Elemans, J. A. A. W. ^{[1
]}

Speller, S. ^{[1
]}

机构：

[1] Radboud Univ Nijmegen, Inst Mol & Mat, NL-6525 ED Nijmegen, Netherlands

[2] Natl Acad Sci Ukraine, B Verkin Inst Low Temp Phys & Engn, UA-61103 Kharkov, Ukraine

来源：

PHYSICAL REVIEW B | 2008年 / 77卷 / 16期

关键词：

D O I：

10.1103/PhysRevB.77.165423

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We used the mechanically controllable break-junction technique to study the consecutive stages of interaction of hydrogen molecules with surfaces of W, Mo, and Ta at 4.2-6 K. This includes the physical adsorption of H-2 molecules, their subsequent chemisorption, their dissociation, and the diffusion of protons into the bulk of the materials. The quantum diffusion is accompanied by 1/f(alpha) contact resistance noise. For tantalum hydride TaHx, we found a 10% increase of the critical temperature T-c with respect to pure Ta.

引用

页数：8

共 13 条

[1] Low-temperature dissociative adsorption of Hydrogen on W, Mo and Ta surfaces studied with Mechanically Controllable Break-Junctions
den Boer, D.
Shklyarevskii, O. I.
Elemans, J. A. A. W.
Speller, S.
PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 2007, 61 : 239 - 242
[2] LOW-TEMPERATURE ELECTRONIC TRANSPORT-PROPERTIES OF W, MO, TA, AND ZR THIN-FILMS
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[3] LOW-TEMPERATURE ADSORPTION OF HYDROGEN ON SI(111) AND (100) SURFACES STUDIED BY ELASTIC RECOIL DETECTION ANALYSIS
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OURA, K
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[4] LOW-TEMPERATURE ADSORPTION AND CONDENSATION OF O-2, H2O AND NO ON PT(111), STUDIED BY CORE LEVEL AND VALENCE BAND PHOTOEMISSION
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[5] Influence of the flux of H2 and D2 molecules on kinetics of low-temperature (down to 5 K) adsorption on the W(110) surface
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[8] INFRARED SPECTROSCOPIC EVIDENCE FOR PHOTO-CHEMICAL GENERATION OF THE METALLOCENES [(ETA-C5H5)2M] (M = MO OR W) IN LOW-TEMPERATURE MATRICES
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[9] LOW-TEMPERATURE ADSORPTION OF H2S ON NI(001) STUDIED BY NEAR-EDGE-X-RAY-ABSORPTION AND SURFACE-EXTENDED-X-RAY-ABSORPTION FINE-STRUCTURE
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MACDOWELL, AA
HASHIZUME, T
SETTE, F
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PHYSICAL REVIEW B, 1989, 40 (14): : 9457 - 9463
[10] STUDIES OF THE HYDROGEN HELD BY SOLIDS .23. LOW-TEMPERATURE ADSORPTION OF H-2 AND D-2 AND THEIR SEPARATION FACTORS ON ALUMINA, FLUORIDED ALUMINA, AND MOLYBDENA-ALUMINA SURFACES
MILLMAN, WS
VANCAUWELAERT, FH
HALL, WK
JOURNAL OF PHYSICAL CHEMISTRY, 1979, 83 (21): : 2764 - 2768

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