Super-resolution bright-field nanometer topographic optical microscopy based on contrast

被引:8
|
作者
Huang, SW
Mong, HY
Lee, CH
机构
[1] Acad Sinica, Res Ctr Appl Sci, Taipei 115, Taiwan
[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 106, Taiwan
关键词
image restoration; nanometer depth resolution; wide-field optical profilometer;
D O I
10.1002/jemt.20091
中图分类号
R602 [外科病理学、解剖学]; R32 [人体形态学];
学科分类号
100101 ;
摘要
By using an expectation-maximization maximum likelihood estimation algorithm to improve the lateral resolution of a recently developed non-interferometric wide-field optical profilometer, we obtain super-resolution bright-field optical images of nanometer features on a flat surface. The optical profilometer employs a 365-nm light source and an ordinary objective lens of a 0.95 numerical aperture. For objects of 100 nm thickness, lateral features about lambda/7 can be resolved in the restored images without fluorescence labeling. Current image acquisition rate is 0.1 frame/sec, which is limited by the brightness of the light source. With a brighter light source, the imaging speed can be fast enough for real-time observation of dynamic activities in the nanometer scale. (C) 2005 Wiley-Liss, Inc.
引用
收藏
页码:180 / 185
页数:6
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