Refractory Plasmonic Hafnium Nitride and Zirconium Nitride Thin Films as Alternatives to Silver for Solar Mirror Applications

被引:18
|
作者
Das, Prasanna [1 ,2 ]
Biswas, Bidesh [1 ,2 ]
Maurya, Krishna Chand [1 ,2 ]
Garbrecht, Magnus [3 ]
Saha, Bivas [1 ,2 ,4 ]
机构
[1] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Bangalore 560064, Karnataka, India
[2] Jawaharlal Nehru Ctr Adv Sci Res, Int Ctr Mat Sci, Bangalore 560064, Karnataka, India
[3] Univ Sydney, Sydney Microscopy & Microanal, Camperdown, NSW 2006, Australia
[4] Jawaharlal Nehru Ctr Adv Sci Res, Sch Adv Mat, Bangalore 560064, Karnataka, India
关键词
concentrated solar power; solar mirror; transition metal nitrides; alternative plasmonic materials; ultrahigh vacuum deposition; refractory nanophotonics; TITANIUM NITRIDE; OPTICAL-PROPERTIES; TEMPERATURE; REFLECTIVITY; REFLECTANCE; EVOLUTION; RATIO;
D O I
10.1021/acsami.2c09852
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Harnessing solar energy by employing concentrated solar power (CSP) systems requires materials with high electrical conductivity and optical reflectivity. Silver, with its excellent optical reflectance, is traditionally used as a reflective layer in solar mirrors for CSP technologies. However, silver is soft and expensive, quickly tarnishes, and requires a protective layer of glass for practical applications. Moreover, supply-side constraints and high-temperature instability of silver have led to the search for alternative materials that exhibit high solar and infrared reflectance. Transition metal nitrides, such as titanium nitride, have emerged as alternative plasmonic materials to gold starting from a spectral range of similar to 500 nm. However, to achieve high solar reflection (similar to 320-2500 nm), materials with epsilon-near-zero starting from the near-ultraviolet (UV) spectral region are required. Here, we show the development of refractory epitaxial hafnium nitride (HfN) and zirconium nitride (ZrN) thin films as excellent mirrors with a solar reflectivity of similar to 90.3% and an infrared reflectivity of similar to 95%. Low-loss and high-quality epsilon-near-zero resonance at near-UV (similar to 340-380 nm) spectral regions are achieved in HfN and ZrN by carefully controlling the stoichiometry, leading to a sharp increase in the reflection edge that is on par with silver. Temperature-dependent reflectivity and dielectric constants are further measured to demonstrate their high temperature suitability. The development of refractory epitaxial HfN and ZrN thin films with high solar and infrared reflectance makes them excellent alternative plasmonic materials to silver and would pave their applications in CSP, daytime radiative cooling, and others.
引用
收藏
页码:46708 / 46715
页数:8
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