Preservation dose of helium-implanted in nanocrystal titanium films

被引:5
|
作者
Zheng, SX [1 ]
Luo, SZ
Liu, ZY
Long, XG
Wang, PL
Peng, SM
Liao, XD
Liu, N
机构
[1] Sichuan Univ, Inst Nucl Sci & Technol, Chengdu 610054, Peoples R China
[2] Key Lab Radiat Phys, Chengdu 610054, Peoples R China
[3] Educ Minist, Chengdu 610054, Peoples R China
[4] China Acad Engn Phys, Inst Nucl Phys & Chem, Mianyang 621900, Peoples R China
关键词
ion implantation; helium; nanocrystal titanium film; preservation dose;
D O I
10.7498/aps.53.555
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Helium concentration profile, preservation dose and release rate from a nanocrystal titanium film implanted with helium at different energy and dose have been measured by proton Rutherford backscattering technique in a range from room temperature to 500degreesC. It is observed that the implanted helium may be stably preserved for a long time in the nanocrystal titanium film in the temperature environment. from room temperature to below 100degreesC when its concentration in up to 41%-52% of He - Ti atomic ratio, and also may be effectively preserved for a long time at room temperature if their atomic concentration ratio is up to 52%-74%. Possible mechanism of-helium effectively preserved in the nanocrystal film with a large boundary volume ratio is preliminarily discussed from the energy viewpoint in this paper.
引用
收藏
页码:555 / 560
页数:6
相关论文
共 6 条
  • [1] LINDAU R, 1992, J NUCL MATER, V191, P178
  • [2] THOMAS GJ, 1983, RADIAT EFF DEFECT S, V78, P37, DOI 10.1080/00337578308207358
  • [3] ULLMAIER H, 1983, RADIAT EFF DEFECT S, V78, P1, DOI 10.1080/00337578308207355
  • [4] ZHANG H, 2001, ACTA MAT COMPOSITAE, V18, P50
  • [5] ZHANG LD, 2001, NANO MAT NANO STRUCT, P68
  • [6] [郑思孝 Zheng Sixiao], 2002, [原子能科学技术, Atomic Energy Science and Technology], V36, P388