High-resolution XEOL spectroscopy setup at the X-ray absorption spectroscopy beamline P65 of PETRA III

被引:1
|
作者
Levcenko, S. [1 ]
Biller, R. [2 ]
Pfeiffelmann, T. [1 ]
Ritter, K. [1 ]
Falk, H. H. [1 ]
Wang, T. [3 ]
Siebentritt, S. [3 ]
Welter, E. [2 ]
Schnohr, C. S. [1 ]
机构
[1] Univ Leipzig, Felix Bloch Inst Festkorperphys, Linnestr 5, D-04103 Leipzig, Germany
[2] Deutsch Elektronen Synchrotron DESY, Notkestr 85, D-22607 Hamburg, Germany
[3] Univ Luxembourg, Dept Phys & Mat Sci, Lab Photovolta, Rue Brill 41, L-4422 Belvaux, Luxembourg
关键词
XEOL; XAS; CuInSe2; ZnO; GaN; EXCITED OPTICAL LUMINESCENCE; SITE-SELECTIVE EXAFS; FINE-STRUCTURE; ORIGIN; ZNO;
D O I
10.1107/S1600577522007287
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A newly designed setup to perform steady-state X-ray excited optical luminescence (XEOL) spectroscopy and simultaneous XEOL and X-ray absorption spectroscopy characterization at beamline P65 of PETRA III is described. The XEOL setup is equipped with a He-flow cryostat and state-of-the-art optical detection system, which covers a wide wavelength range of 300-1700 nm with a high spectral resolution of 0.4 nm. To demonstrate the setup functioning, low-temperature XEOL studies on polycrystalline CuInSe2 thin film, single-crystalline GaN thin film and single-crystalline ZnO bulk semiconductor samples are performed.
引用
收藏
页码:1209 / 1215
页数:7
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