Cratering by MeV-GeV ions as a function of angle of incidence

被引：9
|
作者：
Papaléo, RM
Leal, R
Trautmann, C
Bringa, EM
机构：
[1] Pontificia Univ Catolica Rio Grande do Sul, Fac Phys, BR-90619900 Porto Alegre, RS, Brazil
[2] Gesell Schwerionenforsch mbH, D-64291 Darmstadt, Germany
[3] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2003年 / 206卷
关键词：
ion tracks; cratering; sputtering; polymers; scanning force microscopy;
D O I：
10.1016/S0168-583X(03)00683-9
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We report on a systematic scanning force microscope study of crater formation induced by swift heavy ions as a function of angle of incidence. PMMA films were bombarded with Au-197 (20 MeV), Bi-209 (2320 MeV) and U-238 (2640 MeV) ions at angles 0 varying from 0degrees to 84degrees to the surface normal. In all cases, the length of the craters as well as rim height and length scale with (cos 0)(-1). Crater width showed a much weaker (cos 0)(-0.3) dependence. Similar angular dependences were observed for the different ion species and energies used. The experimental data is compared to molecular dynamics simulations of crater formation in a model solid. The simulations show a (cos 0)(-1) dependence for the crater length, but no dependence for the crater width, unless a wide initial track of excitation is used. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：7 / 12
页数：6
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