Reaction Mechanism of Pt Atomic Layer Deposition on Various Textile Surfaces

被引：11
|
作者：
Oh, Il-Kwon [1 ]
Park, Jong Seo [2 ,3 ]
Khan, Mohammad Rizwan [4 ]
Kim, Kangsik [5 ]
Lee, Zonghoon [5 ]
Shong, Bonggeun [6 ]
Lee, Han-Bo-Ram [4 ]
机构：
[1] Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA
[2] Yonsei Univ, Sch Elect & Elect Engn, Seoul 03722, South Korea
[3] Incheon Natl Univ, Res Inst Engn Technol, Incheon 22012, South Korea
[4] Incheon Natl Univ, Dept Mat Sci & Engn, Incheon 22012, South Korea
[5] UNIST, Sch Mat Sci & Engn, Ulsan 44919, South Korea
[6] Hongik Univ, Dept Chem Engn, Seoul 04066, South Korea
来源：
CHEMISTRY OF MATERIALS | 2019年 / 31卷 / 21期
关键词：
WEARABLE ELECTRONICS; HEATER; ANTIBACTERIAL; FABRICATION; PRESSURE; BEHAVIOR; SENSOR; COTTON; FILMS;
D O I：
10.1021/acs.chemmater.9b03171
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The reaction mechanism of Pt atomic layer deposition (ALD) on various commercial textiles such as cotton, silk, nylon, wool, Kevlar, and Nomex was fundamentally investigated. Pt morphologies on textiles were observed, and it was determined that Pt layers were uniformly deposited on most textile surfaces except nylon, where no notable Pt growth was observed. Morphological analysis, chemical composition measurements as a function of Pt ALD cycles, and the results of quantum chemical calculations enabled the elucidation of the role of the textiles and Pt growth mechanism. The calculated reaction pathways and energy states of Pt precursor molecules that adsorbed on each textile moiety showed different reaction paths, resulting in various Pt ALD growth behaviors. On the basis of the Pt ALD process, a textile resistive heater was fabricated, showing good performance with high stability such as wear rate, high bending stability, and long life.
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页码：8995 / 9002
页数：8
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