In-plane microwave dielectric properties of paraelectric barium strontium titanate thin films with anisotropic epitaxy

被引:45
|
作者
Simon, WK
Akdogan, EK
Safari, A [1 ]
Bellotti, JA
机构
[1] Rutgers State Univ, Dept Mat Sci & Engn, Piscataway, NJ 08854 USA
[2] USN, Res Lab, Div Elect Sci & Technol, Washington, DC 20375 USA
关键词
D O I
10.1063/1.2031938
中图分类号
O59 [应用物理学];
学科分类号
摘要
In-plane dielectric properties of < 110 > oriented epitaxial (Ba0.60Sr0.40)TiO3 thin films in the thickness range from 25-1200 nm have been investigated under the influence of anisotropic epitaxial strains from < 100 > NdGaO3 substrates. The measured dielectric properties show strong residual strain and in-plane directional dependence. Below 150 nm film thickness, there appears to be a phase transition due to the anisotropic nature of the misfit strain relaxation. In-plane relative permittivity is found to vary from as much as 500-150 along [1<overline>1</overline>0] and [001] respectively, in 600 nm thick films, and from 75 to 500 overall. Tunability was found to vary from as much as 54% to 20% in all films and directions, and in a given film the best tunability is observed along the compressed axis in a mixed strain state, 54% along [1<overline>1</overline>0] in the 600 nm film for example. (c) 2005 American Institute of Physics.
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