The infrared wire-grid polarizer consisting of an Al grating, Si, and sol-gel derived zirconia grating film was fabricated by soft imprint process and Al shadow coating processes. A silicone mold was used because of its low surface energy, flexibility, and capability of transferring submicrosized patterns. As a result, the Al grating with a pitch of 400 nm and a depth of 100 nm was obtained on the zirconia grating film. The fabricated polarizer exhibited a polarization function with the TM transmittance greater than that of the Si substrate in the specific wavelength range of 3.6-8.5 mu m, because the zirconia film acted as an antireflection film. The maximum value was 63% at a wavelength of 5.2 mu m. This increment of the TM transmission spectrum results in interference within the zirconia film. Also, the extinction ratio exceeded almost 20 dB in the 3-8.8 mu m wavelength range.
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Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South KoreaYonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea
Ryu, Hojeong
Yoon, Soon Joon
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Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea
Yonsei Univ, Nanomed Natl Core Res Ctr, Seoul 120749, South KoreaYonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea
Yoon, Soon Joon
Kim, Donghyun
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Yonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea
Yonsei Univ, Nanomed Natl Core Res Ctr, Seoul 120749, South KoreaYonsei Univ, Sch Elect & Elect Engn, Seoul 120749, South Korea