MICROANALYSES FOR PIEZORESISTIVE EFFECT ON ACTUAL AND MODELED INTERFACES OF RuO2-GLASS THICK FILM RESISTORS
被引:0
|
作者:
Totokawa, M.
论文数: 0引用数: 0
h-index: 0
机构:
Denso Corp, Aichi, Japan
Toyota Technol Inst, Nagoya, Aichi, JapanDenso Corp, Aichi, Japan
Totokawa, M.
[1
,2
]
Tani, T.
论文数: 0引用数: 0
h-index: 0
机构:
Toyota Technol Inst, Nagoya, Aichi, Japan
Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi, Japan
Toyota Res Inst North Amer, Ann Arbor, MI USADenso Corp, Aichi, Japan
Tani, T.
[2
,3
,4
]
机构:
[1] Denso Corp, Aichi, Japan
[2] Toyota Technol Inst, Nagoya, Aichi, Japan
[3] Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi, Japan
The piezoresistive mechanism of composite thick-films based on RuO2 particles in calcium-borosilicate or bismuth-borosilicate glass matrix was investigated by chemical microanalyses. Diffusion pairs of RuO2 and glass were also prepared as model specimens for the composite thick-film resistors. The resistor based on bismuth-borosilicate glass showed higher sensitivity than that based on calcium-borosilicate glass. The diffusion of ruthenium into glass was examined with TEM-EDS and SIMS and the chemical structure was analyzed with EELS. The bismuth-borosilicate glass with higher piezoresistive sensitivity was found to have larger amount of diffused ruthenium, which has trivalent and tetravalent states in the glass. Furthermore, the electron state of oxygen was revealed to be changed by the diffusion of ruthenium and the existence of holes is indicated. The analyses suggest that the conduction mechanism is variable range hopping conduction (VRHC) that carriers (holes) transfer between different sites of the ruthenium. Piezoresistive effect in this type of system is considered to be the result of the change in distance between sites due to the distortion caused by the external force.
机构:
DENSO CORPORATION, Aichi 4488661, Japan
Toyota Technol Inst, Aichi 4688511, JapanDENSO CORPORATION, Aichi 4488661, Japan
Totokawa, Masashi
Tani, Toshihiko
论文数: 0引用数: 0
h-index: 0
机构:
Toyota Technol Inst, Aichi 4688511, Japan
Toyota Cent Res & Dev Labs Inc, Aichi 4801192, Japan
Toyota Res Inst N Amer, Ann Arbor, MI 48105 USADENSO CORPORATION, Aichi 4488661, Japan
Tani, Toshihiko
Yoshimura, Masamichi
论文数: 0引用数: 0
h-index: 0
机构:
Toyota Technol Inst, Aichi 4688511, JapanDENSO CORPORATION, Aichi 4488661, Japan
Yoshimura, Masamichi
Yamashita, Syuichi
论文数: 0引用数: 0
h-index: 0
机构:
DENSO CORPORATION, Aichi 4488661, JapanDENSO CORPORATION, Aichi 4488661, Japan
Yamashita, Syuichi
Morikawa, Kenji
论文数: 0引用数: 0
h-index: 0
机构:
DENSO CORPORATION, Aichi 4488661, JapanDENSO CORPORATION, Aichi 4488661, Japan
Morikawa, Kenji
Mitsuoka, Yoshihito
论文数: 0引用数: 0
h-index: 0
机构:
DENSO CORPORATION, Aichi 4488661, JapanDENSO CORPORATION, Aichi 4488661, Japan
Mitsuoka, Yoshihito
Nonaka, Takamasa
论文数: 0引用数: 0
h-index: 0
机构:
Toyota Cent Res & Dev Labs Inc, Aichi 4801192, JapanDENSO CORPORATION, Aichi 4488661, Japan
机构:
Purdue Univ, West Lafayette, IN, USA, Purdue Univ, West Lafayette, IN, USAPurdue Univ, West Lafayette, IN, USA, Purdue Univ, West Lafayette, IN, USA
Sarma, D.H.R.
Vest, R.W.
论文数: 0引用数: 0
h-index: 0
机构:
Purdue Univ, West Lafayette, IN, USA, Purdue Univ, West Lafayette, IN, USAPurdue Univ, West Lafayette, IN, USA, Purdue Univ, West Lafayette, IN, USA