Characterization of Graphene Grown on Bulk and Thin Film Nickel

被引:17
|
作者
Lu, Chun-Chieh [1 ]
Jin, Chuanhong [2 ]
Lin, Yung-Chang [1 ]
Huang, Chi-Ruei [1 ]
Suenaga, Kazu [2 ]
Chiu, Po-Wen [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Hsinchu 30013, Taiwan
[2] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058565, Japan
关键词
CHEMICAL-VAPOR-DEPOSITION; EPITAXIAL GRAPHENE; RAMAN-SPECTROSCOPY; SILICON-CARBIDE; LARGE-AREA; GRAPHITE; CARBON; EXFOLIATION; TRANSISTORS; DISORDER;
D O I
10.1021/la2022038
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report on graphene films grown by atmospheric pressure chemical vapor deposition on bulk and thin film nickel. Carbon precipitation on the polycrystalline grains is controlled by the methane concentration and substrate cooling rate. It is found that graphene grows over multiple grains, with edges terminating along the grain boundaries and with dimensions directly correlated to the size of the underlying grains. This greatly restricts the resulting graphene size (<10 mu m) in the thin film growth, whereas monolayer graphene with linear dimensions of hundreds of micrometers takes up the great majority of the surface overlayers on the bulk nickel (>50%). In addition, the number of layers can be better controlled in the bulk growth. Characterizations of the graphene sheets using transmission electron microscopy, Raman spectroscopy, and transport measurements in the field-effect configuration are also discussed.
引用
收藏
页码:13748 / 13753
页数:6
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