GENERATION OF MICROPLASMA IN A REVERSE-BIASED SILICON CARBIDE SCHOTTKY DIODE

被引：0
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作者：
Sonoiki, Oluwayemisi [1 ]
Eden, J. Gary [1 ]
机构：
[1] Univ Illinois, Dept Elect & Comp Engn, Lab Opt Phys & Engn, 306 N Wright St, Urbana, IL 61801 USA
来源：
2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS) | 2017年
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中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
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页数：1
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