Photochemical fine particle formation from gaseous ternary mixtures under visible light irradiation

被引:2
|
作者
Morita, H [1 ]
Nomura, H [1 ]
Kita, Y [1 ]
机构
[1] Chiba Univ, Fac Engn, Dept Informat & Image Sci, Inage Ku, Chiba 2638522, Japan
关键词
aerosol particle formation; photochemical sensitization; glyoxal; acrolein; allyltrimethylsilane; carbon disulfide;
D O I
10.2494/photopolymer.16.109
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Under visible light irradiation at 435.8 nm, gaseous ternary mixtures of glyoxal (GLY), carbon disulfide (CS2), and allyltrimethylsilane (ATMeSi) and of GLY, acrolein (AC), and ATMeSi produced sedimentary aerosol particles. From the analysis of FT-IR spectrum measured with the sedimentary particles, ATMeSi was found to be incorporated into the sedimentary aerosol particles. The product yield increased with increasing partial pressure of GLY and ATMeSi, indicating that excited GLY molecules induced chemical reactions of ATMeSi as well as CS2 and AC. Chemical reactivity of ATMeSi towards excited CS2 was further investigated under UV light irradiation at 313 nm. A gaseous binary mixture of CS2 and ATMeSi produced sedimentary aerosol particles which involved ATMeSi as the major chemical component, showing that ATMeSi was highly reactive towards excited CS2 and chemical reactions between ATMeSi themselves were induced to form sedimentary aerosol particles.
引用
收藏
页码:109 / 114
页数:6
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