Ga2O3(Gd2O3)/GaAs power MOSFETs

被引:16
|
作者
Wang, YC [1 ]
Hong, M [1 ]
Kuo, JM [1 ]
Mannaerts, JP [1 ]
Tsai, HS [1 ]
Kwo, J [1 ]
Krajewski, JJ [1 ]
Chen, YK [1 ]
Cho, AY [1 ]
机构
[1] AT&T Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
关键词
D O I
10.1049/el:19990456
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The power performance of GaAs MOSFETs using Ga2O3(Gd2O3) as the gale dielectric is presented. The I-V characteristics of the power devices are virtually free of hysteresis, indicating low interface state density in the oxide/GaAs interface. When operated at 850MHz cellular frequency and tuned for maximum output power, maximum power-added efficiencies of 45 and 56% were obtained under 3 and 5V operation, respectively. An output power of 26.5dBm was measured from a 1 mu m x 2.4mm device under 5V operation. These results show that the developed GaAs MOSFETs are promising candidates for microwave power amplifiers.
引用
收藏
页码:667 / 669
页数:3
相关论文
共 50 条
  • [1] Ga2O3(Gd2O3)/GaAs power MOSFETs
    Electron. Lett., 8 (667-669):
  • [2] Ga2O3(Gd2O3) as a gate dielectric for GaAs MOSFETs (invited)
    Hong, M
    Kwo, J
    Liu, CT
    Marcus, MA
    Lay, TS
    Ren, F
    Mannaerts, JP
    Ng, KK
    Chen, YK
    Chou, LJ
    Hsieh, KC
    Cheng, KY
    PROCEEDINGS OF THE SYMPOSIUM ON LIGHT EMITTING DEVICES FOR OPTOELECTRONIC APPLICATIONS AND THE TWENTY-EIGHTH STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS, 1998, 98 (02): : 434 - 442
  • [3] Structural properties of Ga2O3(Gd2O3)-GaAs interfaces
    Hong, M
    Marcus, MA
    Kwo, J
    Mannaerts, JP
    Sergent, AM
    Chou, LJ
    Hsieh, KC
    Cheng, KY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (03): : 1395 - 1397
  • [4] On the band-structure lineup at Ga2O3, Gd2O3, and Ga2O3(Gd2O3) heterostructures and Ga2O3 Schottky contacts
    Winfried Mönch
    Journal of Materials Science: Materials in Electronics, 2016, 27 : 1444 - 1448
  • [5] On the band-structure lineup at Ga2O3, Gd2O3, and Ga2O3(Gd2O3) heterostructures and Ga2O3 Schottky contacts
    Moench, Winfried
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (02) : 1444 - 1448
  • [6] Characteristics of Ga2O3(Gd2O3)/GaAs interface:: Structures and compositions
    Hong, M
    Kortan, AR
    Kwo, J
    Mannaerts, JP
    Krajewski, JJ
    Lu, ZH
    Hsieh, KC
    Cheng, KY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (03): : 1688 - 1691
  • [7] Energy band offsets at a Ga2O3(Gd2O3)-GaAs interface
    Lay, TS
    Hong, M
    Kwo, J
    Mannaerts, JP
    Hung, WH
    Huang, DJ
    COMPOUND SEMICONDUCTOR SURFACE PASSIVATION AND NOVEL DEVICE PROCESSING, 1999, 573 : 131 - 135
  • [8] Ga2O3(Gd2O3) as a dielectric insulator for GaAs device applications
    Lay, TS
    Hong, M
    Mannaerts, JP
    Liu, CT
    Kwo, J
    Ren, F
    Marcus, MA
    Ng, KK
    Chen, YK
    Chou, LJ
    Hsieh, KC
    Cheng, KY
    OPTOELECTRONIC MATERIALS AND DEVICES, 1998, 3419 : 78 - 84
  • [9] Demonstration of enhancement-mode p-channel GaAs MOSFETs with Ga2O3(Gd2O3) passivation
    Ren, F
    Hong, M
    Hobson, WS
    Kuo, JM
    Lothian, JR
    Mannaerts, JP
    Kwo, J
    Chu, SNG
    Chen, YK
    Cho, AY
    PROCEEDINGS OF THE TWENTY-SIXTH STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS XXVI), 1997, 97 (01): : 84 - 90
  • [10] GaAs MOSFET's using Ga2O3(Gd2O3) as gate dielectric
    Hong, Minghwei
    International Conference on Solid-State and Integrated Circuit Technology Proceedings, 1998, : 685 - 688