Simulation of an AlGaInAs/InP Electro-Absorption Modulator Monolithically Integrated with Sidewall Grating Distributed Feedback Laser by Quantum Well Intermixing

被引:6
|
作者
Sun, Xiao [1 ]
Cheng, Weiqing [1 ]
Sun, Yiming [1 ]
Ye, Shengwei [1 ]
Al-Moathin, Ali [1 ]
Huang, Yongguang [2 ]
Zhang, Ruikang [2 ]
Liang, Song [2 ]
Qiu, Bocang [3 ]
Xiong, Jichuan [4 ]
Liu, Xuefeng [4 ]
Marsh, John H. [1 ]
Hou, Lianping [1 ]
机构
[1] Univ Glasgow, James Watt Sch Engn, Glasgow G12 8QQ, Lanark, Scotland
[2] Chinese Acad Sci, Inst Semicond, A35 East Qinghua Rd, Beijing 100083, Peoples R China
[3] Shaanxi Univ Sci & Technol, Inst Atom & Mol Sci, Xian 712081, Peoples R China
[4] Nanjing Univ Sci & Technol, Sch Elect & Opt Engn, Nanjing 210094, Peoples R China
基金
英国工程与自然科学研究理事会;
关键词
AlGaInAs; multi-quantum well (MQW); sidewall grating; quantum well intermixing (QWI); MATERIAL PARAMETERS; DFB LASER; FABRICATION; INGAASP; GAAS; SEMICONDUCTORS; RESONANCE; DOTS;
D O I
10.3390/photonics9080564
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A novel AlGaInAs/InP electro-absorption modulated laser (EML) with a simple fabrication process is proposed, in which the electro-absorption modulator (EAM) has a 10 nm blueshift induced by quantum well intermixing (QWI) and is monolithically integrated with a sidewall grating distributed-feedback (DFB) laser working at 1.55 mu m wavelength. The extent of the QWI process is characterized by a diffusion length. The quantum confined Stark effect (QCSE) is simulated in terms of extinction ratio (ER) and chirp for bias electric fields from 0 kV/cm to 200 kV/cm and for different amounts of intermixing. The results indicate that for a 150 mu m-long EAM with a 10 nm blueshift induced by QWI, an ER of 40 dB is obtained at 2.5 V reverse bias with no penalty in chirp compared to an as-grown quantum well (QW) and the insertion loss at 0 V bias is 0.11 dB for 1.55 mu m operation wavelength. The simulated -3 dB bandwidth of the electrical to optical power response is 22 GHz.
引用
收藏
页数:11
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