Low-loss silicon-based hybrid plasmonic waveguide with an air nanotrench for sub-wavelength mode confinement

被引：15
|
作者：
Su, Yalin [1 ]
Zheng, Zheng [1 ]
Bian, Yusheng [1 ]
Liu, Ya [1 ]
Liu, Jiansheng [1 ]
Zhu, Jinsong [2 ]
Zhou, Tao [3 ]
机构：
[1] Beihang Univ, Sch Elect & Informat Engn, Beijing 100191, Peoples R China
[2] Natl Ctr Nanosci & Technol, Beijing 100190, Peoples R China
[3] New Jersey Inst Technol, Dept Phys, Newark, NJ 07102 USA
来源：
MICRO & NANO LETTERS | 2011年 / 6卷 / 08期
关键词：
CONFINING LIGHT; PROPAGATION;
D O I：
10.1049/mnl.2011.0298
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A hybrid plasmonic waveguide based on a silicon-on-insulator substrate with an air trench is proposed and investigated. Theoretical analysis demonstrates that the nano-scale air trench could result in strong local field enhancement and tight mode confinement. Besides, the transmission loss of the fundamental hybrid plasmonic mode could also be reduced despite the existence of the high-index silicon rib. The proposed structure is compatible with standard nanofabrication process based on the silicon wafers and could enable various nanophotonic integrated components.
引用
收藏
页码：643 / 645
页数：3
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