Vb/Ron improvement and current collapse suppression for high power AlGaN/GaN HFETs on Si substrates

被引:1
|
作者
Ikeda, Nariaki [1 ]
Kaya, Shusuke [1 ]
Kokawa, Takuya [1 ]
Kato, Sadahiro [1 ]
机构
[1] Adv Power Device Res Assoc, Nishi Ku, Yokohama, Kanagawa 2200073, Japan
关键词
AlGaN/GaN; HFETs; current collapse; Si substrate; high power device; VOLTAGE; RESISTANCE; OPERATION;
D O I
10.1002/pssc.201000944
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, GaN-based HFET devices on 4-inch Si substrates were fabricated, and the device characteristics were examined. In order to improve a trade-off between the specific on-resistance (RonA) and the breakdown voltage (Vb), a combination of a thin uid (Un-Intentional Doped)-GaN layer and a thick carbon doped GaN layer as a back-barrier layer, resulting in an improvement of V-b without degrading on-state characteristics or current collapse. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:2404 / 2406
页数:3
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