Kinetic Monte Carlo simulations of plasma-surface reactions on heterogeneous surfaces

被引:5
|
作者
Marinov, Daniil [1 ]
机构
[1] IMEC, B-3001 Leuven, Belgium
基金
欧盟地平线“2020”;
关键词
plasma-surface interaction; kinetic Monte Carlo; plasma nano technology; C-H FILMS; OXYGEN-ATOMS; RECOMBINATION REACTIONS; ANODIZED ALUMINUM; DEPOSITION; SILICA; MODEL; O-2;
D O I
10.1007/s11705-019-1837-9
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Reactions of atoms and molecules on chamber walls in contact with low temperature plasmas are important in various technological applications. Plasma-surface interactions are complex and relatively poorly understood. Experiments performed over the last decade by several groups prove that interactions of reactive species with relevant plasma-facing materials are characterized by distributions of adsorption energy and reactivity. In this paper, we develop a kinetic Monte Carlo (KMC) model that can effectively handle chemical kinetics on such heterogenous surfaces. Using this model, we analyse published adsorption-desorption kinetics of chlorine molecules and recombination of oxygen atoms on rotating substrates as a test case for the KMC model.
引用
收藏
页码:815 / 822
页数:8
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