Surface-relief diffraction gratings based on selective etching of periodically poled lithium niobate

被引:8
|
作者
Capmany, J
Fernández-Pousa, CR
Diéguez, E
Bermúdez, V
机构
[1] Univ Miguel Hernandez, Dept Fis & Arquitectura Comp, Elche 03202, Spain
[2] Univ Miguel Hernandez, Dept Ciencia & Technol Mat, Elche 03202, Spain
[3] Univ Autonoma Madrid, Dept Fis Mat, Canto Blanco 28049, Spain
关键词
D O I
10.1063/1.1636535
中图分类号
O59 [应用物理学];
学科分类号
摘要
This work reports the use of selective etching in a periodically poled crystal of LiNbO3 (MgO):Yb3+ to engineer a surface-relief diffraction grating. A 35.1%-64.9% fill factor (domain duty cycle) grating with a 6.86 mum domain period is presented. The diffraction grating created provides a simple tool for accurate characterization of domain size and structure homogeneity. Following a similar process, arbitrary surface-relief two-level binary diffractive optical elements can be patterned in domain-engineered lithium niobate crystals. (C) 2003 American Institute of Physics.
引用
收藏
页码:5145 / 5147
页数:3
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