Tunneling into resistive multiwalled carbon nanotubes

被引：0
|
作者：
Tarkiainen, R [1 ]
Ahlskog, M [1 ]
Roschier, L [1 ]
Hakonen, P [1 ]
Paalanen, M [1 ]
机构：
[1] Helsinki Univ Technol, Low Temp Lab, FIN-02015 Helsinki, Finland
来源：
ELECTRONIC CORRELATIONS: FROM MESO- TO NANO-PHYSICS | 2001年
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D O I：
暂无
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
We have studied electron tunneling between CVD-grown multiwalled carbon nanotube and gold contact in 2-lead and 4-lead measurement geometries with wide contact pads. We have compared the observed zero bias anomaly in tunneling conductance with the predictions of Luttinger liquid, 1D diffusion and coherent conductor models. We will discuss the validity of different models and the implications of their fitting parameters.
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页码：437 / 442
页数：6
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