Reaction products at the interface of IN-738/Si3N4 bond

被引:1
|
作者
Chen, YC
Iwamoto, C
Ishida, Y
机构
[1] Department of Materials Science, Faculty of Engineering, University of Tokyo, Bunkyo-ku, Tokyo 113
来源
MATERIALS TRANSACTIONS JIM | 1996年 / 37卷 / 03期
关键词
Si3N4; IN-738; Ni-based superalloy; diffusion bonding; chemical reaction; morphological instability; faceted phase;
D O I
10.2320/matertrans1989.37.189
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The purpose of this study was to investigate the interface microstructure and reaction products morphology in solid state diffusion bonding of the silicon nitride/Ni-based superalloy (IN-738). Compounds such as Cr3Si, Ni31Si12, delta-Ni2Si and Cr3Ni2Si were identified. A precipitated zone which exists between the reaction products and IN-738 works as a diffusion barrier, the reactive elements of IN-738 seem to be almost blocked to contribute to the formation of Cr3Si, Ni-31 Si-12, delta-Ni2Si, and Cr3Ni2Si. The phenomenon of morphological instability was also explained by Wagner's model. The faceted phases Cr3Ni2Si and delta-Ni2Si showed an epitaxial growth along with the Si3N4 matrix.
引用
收藏
页码:189 / 194
页数:6
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