Silicon-on-insulator technology: Past achievements and future prospects

被引：18
|
作者：
Colinge, JP [1 ]
机构：
[1] Univ Calif Davis, Davis, CA 95616 USA
来源：
MRS BULLETIN | 1998年 / 23卷 / 12期
关键词：
D O I：
10.1557/S0883769400029778
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：16 / 19
页数：4
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