Noble gas ion effects on the XPS valence band spectra of silicon

被引:7
|
作者
Walker, E
Lund, CP
Jennings, P
Cornish, JCL
Klauber, C
Hefter, G
机构
[1] Murdoch Univ, Div Sci & Engn, Murdoch, WA 6150, Australia
[2] CSIRO, Div Minerals, Waterford, WA 6152, Australia
关键词
amorphous silicon; noble gases; ion bombardment; XPS valence band; lineshape analysis;
D O I
10.1016/j.apsusc.2003.08.018
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
X-ray photoelectron spectroscopy (XPS) has been used to study crystalline silicon (c-Si) (1 0 0) surfaces bombarded with argon, xenon and neon to examine the interaction of core peaks from these noble gases with the valence band region of silicon. XPS valence band spectra of xenon- and argon-bombarded silicon were found to have prominent peaks at binding energies of approximately 6 eV for the xenon (5p(1/2), 5P(3/2)) and 9.3 eV for the argon (3p) core levels, respectively. These core level peaks are within the silicon valence band energy range. Attempts to compensate for the interfering peaks are reported but it is concluded that it is better to select a bombarding ion whose core levels do not overlap with the silicon valence band. Results for the ion bombardment are reported for neon, which has a peak at approximately 15.5 eV that does not significantly interfere with the photoelectron valence band spectrum of silicon. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:13 / 16
页数:4
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