Characterization of orientation-dependent etching properties of quartz: Application to 3-D micromachining simulation system

被引：1

作者：

Cheng, D ^{[1
]}

Sato, K ^{[1
]}

Shikida, M ^{[1
]}

Ono, A ^{[1
]}

Sato, K ^{[1
]}

Asaumi, K ^{[1
]}

Iriye, Y ^{[1
]}

机构：

[1] Nagoya Univ, Dept Micro Nano Syst Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan

来源：

SENSORS AND MATERIALS | 2005年 / 17卷 / 04期

关键词：

anisotropic etching; orientation dependence; ammonium bifluoride; single-crystal alpha-quartz;

D O I：

暂无

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Novel characterization results of anisotropic etching properties of single-crystal alpha-quartz for a number of orientations using a spherical specimen are reported. The dimensions of the specimen's surface were measured before and after etching, and the changes were used to calculate the etching rates for a single etching operation for a number of orientations. The etching rates were high at the Z-axis, but not the highest. Low etching rates, sometimes close to zero, were measured for directions perpendicular to the Z-axis. We first report the etching rate distribution perpendicular to the Z-axis. The estimated etching rates further allow us to simulate complete three-dimensional etching for arbitrarily oriented quartz wafers.

引用

页码：179 / 186

页数：8

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