Electrochemical polishing of boron-doped diamond in organic media

被引：23
|
作者：
Panizza, M [1 ]
Siné, G
Duo, I
Ouattara, L
Comninellis, C
机构：
[1] Univ Genoa, Dipartimento Ingn Chim & Proc, I-16129 Genoa, Italy
[2] Swiss Fed Inst Technol, SB ISP UGEC, CH-1015 Lausanne, Switzerland
[3] Univ Cocody, Chim Phys Lab, Abidjan 22, Cote Ivoire
来源：
ELECTROCHEMICAL AND SOLID STATE LETTERS | 2003年 / 6卷 / 12期
关键词：
D O I：
10.1149/1.1619646
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The electropolishing of a boron-doped diamond (BDD) film deposited by chemical vapor deposition has been studied in acetic acid-H2SO4 media. The electropolished surface has been characterized by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and electrochemical measurements. The results have shown that in 1 M H2SO4 no polishing of the surface occurred even after prolonged time; on the contrary, in electrolyte containing 3 M acetic acid in 1 M H2SO4 the morphology changed rapidly. The surface became smoother and the roughness decreased as the typical results of a polishing process. All the non-diamond impurities were also removed by the electropolishing treatment in acetic acid media. (C) 2003 The Electrochemical Society.
引用
收藏
页码：D17 / D19
页数：3
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