Preparation of the Alkyl Complex Ta(=NSiMe3)[N(SiMe3)2](CH2But)2. Preferential Oxygen Insertion in Its Reaction with O2 and a Ligand Exchange in the Alkoxide Ta(=NSiMe3)[N(SiMe3)2](OCH2But)2

被引:18
|
作者
Chen, Shu-Jian [1 ]
Xue, Zi-Ling [1 ]
机构
[1] Univ Tennessee, Dept Chem, Knoxville, TN 37996 USA
基金
美国国家科学基金会;
关键词
CHEMICAL-VAPOR-DEPOSITION; ATOMIC LAYER DEPOSITION; SILYL COMPLEXES; CRYSTAL-STRUCTURE; GROUP-4; AMIDES; TANTALUM; DIOXYGEN; ZIRCONIUM; PRECURSOR; TITANIUM;
D O I
10.1021/om100493s
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
The alkyl amide imide complex Ta(=NSiMe3)[N(SiMe3)(2)](CH2But)(2) (2) has been prepared from the reaction of {Ta(mu-Cl)Cl(=NSiMe3)[N(SiMe3)(2)]}(2) (1) with LiCH2But. Reaction of 2 with O-2 leads to the preferential insertion of oxygen into the two Ta-alkyl bonds, yielding an alkoxy complex, Ta(=NSiMe3)[N(SiMe3)(2)](OCH2But)(2) (3). 3 undergoes a ligand exchange to give Ta-2(mu-NSiMe3)(2)-(OCH2But)(6) (4) and Ta(=NSiMe3)[N(SiMe3)(2)](2)(OCH2But) (5). The exchange reaches an equilibrium: 2 3 = 1/24 + 5; K-eq = 2.10(11) x 10(-4) at 296 K; Delta G degrees(296K) = 4.98(3) kcal. 3 and Shave also been prepared from the reactions of 1 with LiOCH2But, and LiN(SiMe3)(2) and LiOCH2But, respectively. 2 and 4 have been characterized by single-crystal X-ray diffraction.
引用
收藏
页码:5579 / 5584
页数:6
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