Study of Nd(Zn0.5Ti0.5)O3 Dielectric Thin Films Fabricated Using Sol-Gel Method

被引:0
|
作者
Tseng, Ching-Fang [1 ]
Huang, Bo-Yan [1 ]
Hsu, Cheng-Hsing [2 ]
机构
[1] Natl United Univ, Dept Elect Engn, 2 Lien Da,Nan Shih Li, Miaoli 36063, Taiwan
[2] Natl United Univ, Dept Elect Engn, 2 Lien Da,Nan Shih Li, Miaoli 36063, Taiwan
关键词
sol-gel method; Nd(Zn0.5Ti0.5)O-3 thin film; microstructure; electrical properties; CERAMICS;
D O I
10.18494/SAM4041
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We investigated the microstructures and electrical properties of Nd(Zn0.5Ti0.5)O-3 thin films fabricated using the sol-gel method at various preheating temperatures and annealing temperatures. The composites and their morphological characteristics were analyzed using X-ray diffraction (XRD) and scanning electron microscopy (SEM) and were found to be sensitive to both the preheating temperature (100-300 degrees C) and annealing temperature (600-800 degrees C). The diffraction pattern indicated that the deposited films exhibit a polycrystalline microstructure. The dielectric constant and leakage current density of the Nd(Zn0.5Ti0.5)O-3 thin films at a preheating temperature of 300 degrees C and an annealing temperature of 700 degrees C were 16 and 2.13 x 10(-8), respectively. The experimental data for Nd(Zn0.5Ti0.5)O-3 thin films can be applied to wireless communication microwave components, such as temperature-sensing antennas.
引用
收藏
页码:3561 / 3567
页数:7
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