Deposition ytterbium oxide thin films by RF magnetron sputtering

被引：0

作者：

Xu Ning ^{[1
]}

Liu Zhengtang ^{[1
]}

Liu Wenting ^{[1
]}

Shen Yaming ^{[1
]}

机构：

[1] NW Polytech Univ, Sch Mat Sci & Engn, Xian 710072, Peoples R China

来源：

RARE METAL MATERIALS AND ENGINEERING | 2007年 / 36卷

关键词：

RF magnetron sputtering; ytterbium oxide; thin film;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Yb2O3 thin films are successfully prepared by RF sputtering method, with ytterbium oxide as the target. The deposition rate, composition, structure, refractive index and extinction coefficient have been investigated. The results show that Yb and O atoms in the films form Yb2O3 and the adhesiveness of films is good. The films are polycrystalline with cubic phase. Beyond the wavelength of 0.8 mu m, the refractive index is about 1.66, and the extinction coefficient is very low.

引用

页码：82 / 85

页数：4

共 8 条

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