Evaluation of Nanoporous Organosilicate Films as Supports for Pd Based Hydrogen Sensing

被引:0
|
作者
Hohenberger, Erik [1 ]
Zeng, Vivian [2 ]
Xiao, Zhili [2 ,3 ]
Korampally, Venumadhav [1 ]
机构
[1] Northern Illinois Univ, Dept Elect Engn, De Kalb, IL 60115 USA
[2] Argonne Natl Lab, Argonne, IL 60439 USA
[3] Northern Illinois Univ, Dept Phys, De Kalb, IL 60115 USA
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present our preliminary efforts on the evaluation of novel nanoporous organosilicate thin films as supports to drive the formation of Pd nanostructures for application as Pd based resistive sensors. Nanoporous organosilicate thin films are a recently developed technology offering great versatility in being able to fine tune their three dimensional nanostructure, degree of porosity, pore sizes and thicknesses. The underlying surface texture is then utilized to direct the formation of high surface area Pd nanoclusters by depositing Pd upon these films at different thicknesses (In this study -5 nm and 10 nm). These samples where then configured to be used as resistance based hydrogen sensors. The response of the various samples to exposure to 1% hydrogen were studied and discussed. Pd films deposited upon nanoporous films exhibited improved sensor characteristics and interesting contrasting behavior when compared to Pd thin films of the same thickness deposited upon flat control substrates.
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页码:632 / 636
页数:5
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