ULTRA-HIGH ENERGY RESOLUTION EELS

被引：0
|
作者：
Krivanek, O. L. [1 ,2 ]
Bleloch, A. L. [1 ]
Corbin, G. [1 ]
Dellby, N. [1 ]
Hoffman, M. V. [1 ]
Lovejoy, T. C. [1 ]
机构：
[1] Nion R&D, 11511 NE 118th St, Kirkland, WA 98034 USA
[2] Arizona State Univ, Dept Phys, Tempe, AZ 85287 USA
来源：
RECENT TRENDS IN CHARGED PARTICLE OPTICS AND SURFACE PHYSICS INSTRUMENTATION | 2018年
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：42 / 42
页数：1
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