A carbon arc process for treatment of CF4 emissions

被引:17
|
作者
Chen, DT
David, MM
Tiers, GVD
Schroepfer, JN
机构
[1] 3M Ctr, 3M Occupat Hlth & Environm Safety Div, St Paul, MN 55144 USA
[2] 3M Ctr, 3M Corp Res Labs, St Paul, MN 55144 USA
关键词
D O I
10.1021/es980533w
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Light perfluorocarbons, such as carbon tetrafluoride, are produced or emitted from a Variety of processes, including manufacture of aluminum and processing of semiconductor devices. At the same time, the long atmospheric lifetime and high global warming potential of such compounds makes them an environmental concern. A new process far the abatement of perfluorocarbon emissions using a carbon are plasma was investigated, in particular, the conversion of CF4 to C2F4 and higher fluorinated species, including poly(tetrafluoroethylene) (PTFE) was demonstrated. General features of the reaction chemistry are discussed, including primary reactions to form radicals and ions and secondary reactions to form C2F4 and higher compounds. The conversion efficiencies and products obtained in the reported experiments indicate potential applicability of the process for point source emission control of high global warming potential perfluorocarbons.
引用
收藏
页码:3237 / 3240
页数:4
相关论文
共 50 条
  • [1] CF4 Treatment Characteristics using an Elongated Arc Reactor
    Kim, Kwan-Tae
    Lee, Dae Hoon
    Lee, Jae-Ok
    Cha, Min Suk
    Song, Young-Hoon
    JOURNAL OF KOREAN SOCIETY FOR ATMOSPHERIC ENVIRONMENT, 2010, 26 (01) : 85 - 93
  • [2] Synthesis of carbon nanotubes by arc discharge in CF4 gas atmosphere
    Yokomichi, H
    Matoba, M
    Sakima, H
    Ichihara, M
    Sakai, F
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (12A): : 6492 - 6496
  • [3] Characteristics of rotating arc for CF4 removal
    Environmental System Research Center, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea, Republic of
    不详
    International Journal of Environment and Waste Management, 2008, 2 (4-5) : 412 - 422
  • [5] Morphology and electronic properties of carbon nanotubes synthesized by arc discharge in CF4 gas
    Yokomichi, H
    Sakima, H
    Matoba, M
    Ichihara, M
    Sakai, F
    SUPERLATTICES AND MICROSTRUCTURES, 1999, 25 (1-2) : 487 - 491
  • [6] Fluorination of carbon nanotubes in CF4 plasma
    Plank, NOV
    Jiang, LD
    Cheung, R
    APPLIED PHYSICS LETTERS, 2003, 83 (12) : 2426 - 2428
  • [7] Reduction of CF4 emissions from the aluminum smelter in Essen
    Iffert, M
    Opgen-Rhein, J
    Ganther, R
    LIGHT METALS 2002, 2002, : 297 - 304
  • [8] Impact of CF4 plasma treatment on GaN
    Chu, Rongming
    Suh, Chang Soo
    Wong, Man Hoi
    Fichtenbaum, Nicholas
    Brown, David
    McCarthy, Lee
    Keller, Stacia
    Wu, Feng
    Speck, James S.
    Mishra, Umesh K.
    IEEE ELECTRON DEVICE LETTERS, 2007, 28 (09) : 781 - 783
  • [9] Surface wave plasma abatement of CHF3 and CF4 containing semiconductor process emissions
    Wofford, BA
    Jackson, MW
    Hartz, C
    Bevan, JW
    ENVIRONMENTAL SCIENCE & TECHNOLOGY, 1999, 33 (11) : 1892 - 1897
  • [10] Combination of glow-discharge and arc plasmas for CF4 abatement
    Huang, AM
    Xia, GG
    Spiess, FJ
    Chen, X
    Rozak, J
    Suib, SL
    Takahashi, T
    Hayashi, Y
    Matsumoto, H
    RESEARCH ON CHEMICAL INTERMEDIATES, 2001, 27 (09) : 957 - 974