Patterning neuronal and glia cells on light-assisted functionalised photoresists

A common photosensitive polymeric material used in semiconductor microlithography (diazo-naphto-quinone/novolak resist) was pattern-exposed with near-UV light to create carboxylic-rich areas on the polymer surface. The patterned surfaces were further functionalised via: (1) the anchorage of peptides for specific cell-attachment or cell-detachment functions; or (2) the diffusion of silicon rich chemical species to achieve the cell detachment. Pairs of antagonistic surface characteristics controlled the cell attachment: (1) amino-rich or carboxylic-rich surfaces; and (2) hydrophilic or hydrophobic surfaces; in which the former promoted the adhesion. It was found that common microlithographic materials and techniques can be upgraded to allow an effective control of the lateral organisation of the artificial arrays of neuronal and glia cells. (C) 1999 Elsevier Science S.A. All rights reserved.