Synthesis of nickel-filled carbon nanotubes at 350 °C

被引:17
|
作者
El Mel, A. A. [1 ]
Gautron, E. [1 ]
Angleraud, B. [1 ]
Granier, A. [1 ]
Tessier, P. Y. [1 ]
机构
[1] Univ Nantes, CNRS, IMN, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
关键词
THIN-FILMS; GROWTH; NANOPARTICLES;
D O I
10.1016/j.carbon.2011.06.001
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The deposition of nickel/amorphous carbon (Ni/a-C) films by a hybrid plasma process combining magnetron sputtering of a Ni target and plasma enhanced chemical vapor deposition using methane gas has been investigated. The formation of nickel nanowires encapsulated by a-C matrix has been demonstrated by transmission electron microscopy (TEM). The obtained nanowires array can be easily dispersed or can be simply converted to a Ni-filled CNT array by annealing at 350 degrees C as confirmed by TEM analysis. The developed fabrication method of Ni-filled CNT array is a low temperature technique compatible with substrates of low melting point. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:4595 / 4598
页数:4
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