Two-Photon Continuous Flow Lithography

被引：55

作者：

Laza, Simona C. ^{[1
]}

Polo, Marco ^{[1
]}

Neves, Antonio A. R. ^{[1
]}

Cingolani, Roberto ^{[4
]}

Camposeo, Andrea ^{[1
,2
]}

Pisignano, Dario ^{[1
,2
,3
]}

机构：

[1] Univ Salento, Ist Nanosci CNR, Natl Nanotechnol Lab, I-73100 Lecce, Italy

[2] Ist Italiano Tecnol, Ctr Biomol Nanotechnol UNILE, I-73010 Arnesano, Italy

[3] Univ Salento, Dipartimento Ingn Innovaz, I-73100 Lecce, Italy

[4] Italian Inst Technol, I-16163 Genoa, Italy

来源：

ADVANCED MATERIALS | 2012年 / 24卷 / 10期

关键词：

3D CELL-MIGRATION; POLYMERIC MICROPARTICLES; MICROFLUIDIC DEVICE; DRUG-DELIVERY; FABRICATION; PARTICLES; SHAPE; PHOTOPOLYMERIZATION; MICROFABRICATION; PHOTOLITHOGRAPHY;

D O I：

10.1002/adma.201103357

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new approach for microfluidics- based production of polymeric particles, namely two- photon continuous flow lithography, is reported. This technique takes advantage of two- photon lithography to create objects with sub- micrometer and 3D features, and overcomes the traditional process limitations of two- photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow- tie particles with sub- diffraction resolution and surface roughness as low as 10 nm are demonstrated.

引用

页码：1304 / 1308

页数：5

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