Measurement of electrical properties of GaN thin films using Terahertz-time domain spectroscopy

被引:19
|
作者
Nagashima, T
Takata, K
Nashima, S
Harima, H
Hangyo, M
机构
[1] Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan
[2] Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
[3] Kyoto Inst Technol, Dept Elect & Informat Sci, Sakyo Ku, Kyoto 6068505, Japan
关键词
THz; spectroscopy; electrical properties; thin film;
D O I
10.1143/JJAP.44.926
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate the noncontact and nondestructive evaluation of electrical properties of n-type GaN thin films on sapphire substrates using time domain spectroscopy in the THz frequency region (THz-TDS). DC resistivities of the GaN films with various free carrier densities are deduced by fitting the transmission spectra of the sample to the Drude model. The DC resistivities obtained by the THz-TDS show good agreement with those obtained by the conventional contact measurements. Mobilities of the free carriers in lightly doped GaN films are also determined by the Drude fit. It is found that the temperature dependence of the mobilities for the lightly doped films shows a peak at similar to 150K. The temperature dependences of the free carrier densities for the lightly doped films obtained by the THz measurements are compared with that predicted by a model with two kinds of donors reported previously.
引用
收藏
页码:926 / 931
页数:6
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