Induced lattice defects in InGaAs photodiodes by high-temperature electron irradiation

被引:13
|
作者
Ohyama, H
Kobayashi, K
Vanhellemont, J
Simoen, E
Claeys, C
Takakura, K
Hirao, T
Onoda, S
机构
[1] Kumamoto Natl Coll Technol, Kumamoto 8611102, Japan
[2] NEC IC Microcomp Syst Ltd, Kumamoto 08691197, Japan
[3] State Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium
[4] IMEC, B-3001 Louvain, Belgium
[5] Katholieke Univ Leuven, EE Dept, B-3001 Heverlee, Belgium
[6] Takasaki JAERI, Gunma 3701292, Japan
[7] Tokai Univ, Kanagawa 2591292, Japan
关键词
InGaAs photodiode; radiation damage; 2-MeV electron; high-temperature irradiation;
D O I
10.1016/j.physb.2003.09.080
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Results of a detailed study of the effects of high-temperature 2-MeV electron irradiation on the performance degradation of InGaAs photodiodes are presented. The macroscopic device performance will be correlated with the radiation-induced defects observed by deep level transient spectroscopy. It was found that the dark current increases after irradiation, while the photocurrent decreases. After irradiation, one majority electron capture level with (E-c-0.37eV) was induced in the n-InGaAs layer, while no minority hole traps were found. Additionally, the degradation of the device performance and the introduction rate of the lattice defects decrease with increasing irradiation temperature. For a 300degreesC irradiation, the reduction of the photocurrent is only 40% of the starting value. This result suggests that the creation and recovery of the radiation damage proceeds simultaneously at high temperatures. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:337 / 340
页数:4
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