共 50 条
- [1] Assessment of oxide charge density and centroid from Fowler-Nordheim derivative characteristics in MOS structures after uniform gate stress Microelectron Reliab, 11-12 (1619-1622):
- [2] Generalized trapping kinetic model for the oxide degradation after Fowler-Nordheim uniform gate stress J Appl Phys, 5 (2548):
- [5] Influence of gate material on the oxide degradation in MOS structures during high-field Fowler-Nordheim stress PROCEEDING OF THE TENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOLS I AND II, 2000, 3975 : 892 - 895
- [7] EFFECTS OF A FOWLER-NORDHEIM INJECTION ON THIN OXIDE MOS STRUCTURES REVUE DE PHYSIQUE APPLIQUEE, 1985, 20 (04): : 225 - 234