Band Gap and Conductivity Measurement of TiO2 Thin Films Deposited by Sol-Gel spin Coating Method

被引：1
|
作者：
Rathee, Davinder [1 ]
Kumar, Mukesh [2 ]
Arya, Sandeep K. [1 ]
Sharma, Mukesh [3 ]
机构：
[1] Guru Jambeshwer Univ Sci & Technol, Dept Elect & Commun Engn, Hisar, Haryana, India
[2] Kurukshetra Univ, Elect Sci Dept, Kurukshetra 132119, Haryana, India
[3] Rawal Coll Engn Techno & Management, Dept Elect & Commun, Faridabad, India
来源：
ADVANCED MATERIALS IN MICROWAVES AND OPTICS | 2012年 / 500卷
关键词：
Thin films; TiO2; XRD; Band Gap; Conductivity; TITANIUM-DIOXIDE; PHOTOCATALYSIS; OXIDES;
D O I：
10.4028/www.scientific.net/KEM.500.273
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin films of TiO2 have been deposited on to cleaned glass substrate by sol gel spin coating method. The XRD analyses confirm different crystalline phases of TiO2 thin films. The grain size calculated by the help of Scherer's formula and found to be 23nm, 37nm and 54 nm respectively for TiO2(004), TiO2(200) and TiO2(211) orientations. The band gap was calculated 3.6 eV by UV-spectrophotometer. The refractive index of the TiO2 film was measured by Ellipsometry and found to be 2.33. Conductivity was measured using Current voltage (I-V) characteristics. To determine composition and thermal stability, thermo gravimetric Analyzer (TGA) and Differential Scanning Calorimeter (DSC) analysis was made on samples.
引用
收藏
页码：273 / +
页数：2
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