Defluorination Treatment of Polytetrafluoroethylene by B2H6/He Plasma at Atmospheric Pressure

被引：2
|
作者：
Furuse, Kiichi [1 ]
Sawada, Yasushi [2 ]
Takahashi, Kazuo [1 ]
Kogoma, Masuhiro [1 ]
Tanaka, Kunihito [1 ]
机构：
[1] Sophia Univ, Fac Sci & Technol, Dept Mat & Life Sci, Chiyoda Ku, Tokyo, Japan
[2] Air Water R&D Co Ltd, Matsumoto, Nagano, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2015年 / 28卷 / 03期
关键词：
polytetrafluoroethylene; surface treatment; atmospheric pressure glow plasma; defluorination; adhesion improvement; GLOW PLASMA; ADHESIVE STRENGTH; IMPROVEMENT; FILMS;
D O I：
10.2494/photopolymer.28.465
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
B2H6/He plasma and B2H6/H-2/He plasma treatments of PTFE were performed. Concentration of the B2H6 was varied through this experiment. Then defluorination degree and adhesive strength were measured. While B2H6 and hydrogen were effective for defluorination of PTFE surface, oxygen functional groups generated by post-oxidation improved adhesive strength. The atmospheric pressure glow plasma treatment with lower diborane concentration more modifies PTFE surface.
引用
收藏
页码：465 / 469
页数：5
相关论文
共 50 条
  • [1] Defluorination Treatment of Polytetrafluoroethylene Surface by Atmospheric Pressure Glow Plasma with Boron Source
    Tanaka, Kunihito
    Takahashi, Kazuo
    Kogoma, Masuhiro
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2010, 23 (04) : 549 - 553
  • [2] B2H6 plasma doping with "in-situ He pre-amorphization"
    Sasaki, Y
    Jin, CG
    Tamura, H
    Mizuno, B
    Higaki, R
    Satoh, T
    Majima, K
    Sauddin, H
    Takagi, K
    Ohmi, S
    Tsutsui, K
    Iwai, H
    2004 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, 2004, : 180 - 181
  • [3] Improvement of Adhesive Strength of Polytetrafluoroethylene by Defluorination Treatment with Combination of Atmospheric Pressure Glow Plasma Treatment and Chemical Transport Method
    Kogoma, Masuhiro
    Takahashi, Kazuo
    Tanaka, Kunihito
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2011, 24 (04) : 441 - 445
  • [4] DISSOCIATION OF B2H6 AND ADSORPTION OF THE FRAGMENTS OF B2H6 ON THE STEPPED Ge(100) SURFACE
    Turkmenoglu, Mustafa
    Katircioglu, Senay
    SURFACE REVIEW AND LETTERS, 2012, 19 (03)
  • [5] Impact of B2H6 plasma treatment on contact resistivity in silicon heterojunction solar cells
    Gotoh, Kazuhiro
    Ozaki, Ryo
    Morimura, Motoo
    Tanaka, Aki
    Iseki, Yoshiko
    Nakamura, Kyotaro
    Muramatsu, Kazuo
    Kurokawa, Yasuyoshi
    Ohshita, Yoshio
    Usami, Noritaka
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SK)
  • [6] Formation of [BH3]2$+- and [B2H6]2$+- from the homogeneous reduction of B2H6
    1600, (116):
  • [7] FORMATION OF [BH3](2-) AND [B2H6](2-) FROM THE HOMOGENEOUS REDUCTION OF B2H6
    GODFROID, RA
    HILL, TG
    ONAK, TP
    SHORE, SG
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1994, 116 (26) : 12107 - 12108
  • [8] Decomposition of B2H6 on Ni(100)
    Desrosiers, RM
    Greve, DW
    Gellman, AJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (04): : 2181 - 2189
  • [9] The geometrical structure of B2H6 molecule
    Yan, SY
    Ma, MZ
    Zhu, ZH
    ACTA PHYSICA SINICA, 2005, 54 (07) : 3106 - 3110
  • [10] THEORETICAL-STUDY OF B2H-5(+), B2H-6(+), AND B2H6
    CURTISS, LA
    POPLE, JA
    JOURNAL OF CHEMICAL PHYSICS, 1988, 89 (08): : 4875 - 4879
12345