High-performance non-volatile field-effect transistor memories using an amorphous oxide semiconductor and ferroelectric polymer

被引:14
|
作者
Wang, Yu [1 ]
Kizu, Takio [2 ]
Song, Lei [1 ]
Zhang, Yujia [1 ]
Jiang, Sai [1 ]
Qian, Jun [1 ]
Wang, Qijing [1 ]
Shi, Yi [1 ]
Zheng, Youdou [1 ]
Nabatame, Toshihide [3 ]
Tsukagoshi, Kazuhito [2 ]
Li, Yun [1 ]
机构
[1] Nanjing Univ, Collaborat Innovat Ctr Adv Microstruct, Sch Elect Sci & Engn, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China
[2] Natl Inst Mat Sci, Int Ctr Mat Nanoarchitecton WPI MANA, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan
[3] Natl Inst Mat Sci, MANA Foundry & MANA Adv Device Mat Grp, Tsukuba, Ibaraki 3050044, Japan
关键词
THIN-FILM TRANSISTORS; MOBILITY; DEVICES;
D O I
10.1039/c6tc01768a
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ferroelectric field-effect transistors (Fe-FETs) are of great interest for a variety of non-volatile memory device applications. High-performance top-gate Fe-FET memories using ferroelectric polymers of poly( vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) and the inorganic oxide of InSiO were fabricated. The extracted electron mobility was as high as 84.1 cm(2) V-1 s(-1) in a low-frequency state. The interfacial charge transfer between the P(VDF-TrFE) and InSiO during annealing of the P(VDF-TrFE) layer benefits improvement in the device performance. The results show the potential of our Fe-FET memories for next-generation electronics.
引用
收藏
页码:7917 / 7923
页数:7
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